(PR) NanoIC Launches Advanced Interconnect PDKs for Chip-to-Chip Designs

Key Takeaways

• NanoIC releases fine‑pitch RDL and D2W PDKs.
• RDL achieves 1.3 µm lines, 20 µm microbump pitch.
• Hybrid bonding removes copper bump parasitics, boosts bandwidth.
• Early‑access kits target universities, start‑ups, SMEs.
• Enables chiplet integration for AI, HPC, automotive.

Pulse Analysis

The semiconductor ecosystem is rapidly shifting from monolithic dies to heterogeneous chiplet assemblies, and interconnect density has become the performance bottleneck. NanoIC’s fine‑pitch RDL PDK tackles this challenge by leveraging polymer‑based substrates that were previously limited to coarse routing. With line widths as narrow as 1.3 µm and microbump pitches of 20 µm, designers can achieve tighter signal paths, reducing latency and power consumption. This capability aligns with the UCIe‑Advanced specification, positioning European research labs to compete with leading foundries in high‑bandwidth, low‑energy packaging.

Equally transformative is the D2W hybrid bonding PDK, which replaces conventional copper microbumps with direct oxide‑to‑oxide connections. The elimination of copper‑induced parasitics yields cleaner signal integrity and higher bandwidth, crucial for AI accelerators and next‑generation GPUs that demand terabit‑per‑second inter‑chip links. By providing a validated design rule set and automated routing tools, the kit shortens the development cycle, allowing innovators to move from simulation to silicon faster than ever before.

Beyond the technical merits, the strategic impact of these early‑access kits cannot be overstated. They democratize cutting‑edge packaging technology, giving startups and academic groups the same design foundation previously reserved for large incumbents. This openness accelerates ecosystem growth, fuels talent development, and encourages a broader range of applications—from autonomous vehicle processors to edge‑AI modules. As the kits mature toward full tape‑out capability, they will likely become a cornerstone of Europe’s push to lead in beyond‑2 nm chiplet integration.