Governor Hochul Announces NY Creates Begins Installation of the First Major Tool for High NA EUV Lithography Center at Albany Nanotech Complex

Why It Matters

The installation gives the United States a domestic research platform for sub‑2 nm chip production, strengthening supply‑chain resilience and keeping American firms ahead of global rivals.

Key Takeaways

• Tokyo Electron's LITHIUS Pro DICE installed, first High NA EUV tool
• $10 billion NY Creates partnership includes $1 billion state investment
• First “first light” of High NA EUV expected before year‑end 2026
• Center will enable sub‑2 nm chip research for AI and HPC
• Public‑private collaboration draws IBM, Micron, ASML, boosting U.S. chip ecosystem

Pulse Analysis

The United States has poured billions into semiconductor revitalization since the passage of the CHIPS and Science Act, yet the most advanced lithography equipment remains scarce on domestic soil. New York’s NY Creates initiative bridges that gap by establishing the High NA EUV Lithography Center, the continent’s first publicly owned facility capable of handling the next‑generation extreme ultraviolet process. By anchoring the center at the Albany NanoTech Complex, the state leverages existing research infrastructure while signaling a long‑term commitment to keep critical chip R&D within U.S. borders.

High NA EUV lithography pushes the resolution limit of photolithography, enabling patterning below 2 nm—a prerequisite for the most power‑efficient processors, high‑bandwidth memory and advanced AI accelerators. Tokyo Electron’s LITHIUS Pro DICE coater/developer will prepare wafers for the forthcoming ASML EXE:5200B scanner, creating a complete workflow from resist coating to exposure. Researchers at universities and corporate labs will be able to experiment with new materials, multi‑patterning strategies and novel device architectures without needing to ship designs overseas, accelerating the innovation cycle.

The $10 billion public‑private partnership, anchored by $1 billion of Empire State Development funds and commitments from IBM, Micron, Applied Materials and others, is expected to generate high‑skill jobs and attract further private investment to upstate New York. By providing open access to world‑class tools, the center cultivates a regional ecosystem that can compete with the dominant Asian fabs and helps the United States maintain technological leadership in the strategic chip arena. As “first light” approaches, the Albany facility positions the U.S. to meet future demand for AI‑driven computing while reducing reliance on foreign supply chains.