The ability to transport charge without dissipation in a zero‑field fractional topological state could dramatically reduce power consumption in future quantum circuits and advance scalable quantum computing architectures.
The fractional quantum Hall effect revealed quasiparticles with fractional charge, inspiring the search for lattice analogues that operate without magnetic fields. Known as fractional Chern insulators, these states promise topological protection compatible with chip‑scale devices. Historically, achieving zero longitudinal resistance—a signature of truly dissipationless transport—has been challenging, keeping practical applications out of reach. The University of Washington team now reports edge channels that conduct current without heat loss, delivering the first clear demonstration of a dissipationless fractional Chern insulator and bridging theory with experiment.
Key to the breakthrough was a two‑pronged materials strategy. The researchers adopted horizontal flux crystal growth, which lifted carrier mobility by more than tenfold compared with earlier samples. Simultaneously, they refined the twisted bilayer molybdenum ditelluride assembly, tightening the twist‑angle tolerance and suppressing disorder at the interface. These advances eliminated the residual longitudinal resistance observed in the 2023 fractional quantum anomalous Hall demonstration, allowing the system to reach a two‑thirds band‑filling where edge conduction became essentially loss‑free.
The dissipationless FCI opens a new route toward low‑power quantum interconnects and fault‑tolerant qubits, where heat generation is a primary bottleneck. However, the study uncovered an unexpected thermal activation gap that shrinks as magnetic field strength increases, a behavior opposite to conventional fractional quantum Hall states. Understanding this anomaly will be crucial for stabilizing the topological phase under realistic operating conditions. As crystal‑growth techniques continue to evolve, the community anticipates that even higher‑mobility devices will enable scalable architectures, positioning fractional Chern insulators as a cornerstone of next‑generation quantum technology.
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