Enhanced Selectivity of Hydrogen Sulfide Gas by Hybrid Zeolitic Imidazolate Framework‐67/2D Platinum Diselenide‐Based Sensors Toward Wafer‐Scale Production

Why It Matters

The breakthrough combines high selectivity with wafer‑scale manufacturability, paving the way for commercial H2S monitoring solutions in environmental and industrial settings.

Key Takeaways

• ZIF-67 layer boosts H2S/NH3 selectivity tenfold
• Sensor reaches 163% response at 10 ppm H2S
• Detects H2S down to 12 ppb theoretical limit
• Uniform performance demonstrated on 4‑inch wafer
• Stable operation under heat and humidity for one month

Pulse Analysis

Hydrogen sulfide (H2S) is a toxic gas that poses significant risks in petrochemical, wastewater, and mining operations, driving demand for sensors that can detect it at parts‑per‑billion levels. Conventional metal‑oxide sensors often struggle with cross‑sensitivity to ammonia and require high operating temperatures, limiting their deployment in low‑power or portable devices. Two‑dimensional (2D) materials such as PtSe2 have attracted attention for gas sensing because of their high surface‑to‑volume ratio, yet translating laboratory prototypes into large‑area products has remained a bottleneck.

The hybrid ZIF‑67@PtSe2 sensor addresses these challenges by integrating a metal‑organic framework (MOF) that selectively adsorbs H2S molecules onto the PtSe2 channel. Density functional theory calculations reveal that the cobalt centers in ZIF‑67 preferentially bind H2S, while steric hindrance blocks larger NH3 molecules, explaining the tenfold increase in selectivity. Experimentally, the sensor delivers a 163% response at 10 ppm H2S and a theoretical limit of detection of 12 ppb, outperforming many existing 2D‑based detectors. Moreover, the device maintains stable output after a month of continuous exposure to high temperature and humidity, underscoring its robustness for real‑world monitoring.

Beyond performance, the study demonstrates a scalable fabrication route: plasma‑assisted selenization of PtSe2 followed by solution‑based ZIF‑67 deposition on a 4‑inch SiO2/Si wafer. Uniform film thickness and repeatable sensor characteristics across the wafer suggest compatibility with standard semiconductor manufacturing lines. This wafer‑scale approach could accelerate the transition of high‑selectivity 2D gas sensors from research labs to commercial markets, enabling widespread deployment in environmental compliance, occupational safety, and smart‑city air‑quality networks.