US Lawmakers Aim to Ban Export of DUV Chipmaking and Etching Tools to Leading Firms in China — Bipartisan Proposal Would Ban Lithography Equipment for Huawei, SMIC, and Others

A bipartisan group of U.S. senators has introduced the MATCH Act, shifting export controls on advanced wafer‑fabrication equipment from fab‑level to company‑level restrictions. The bill would bar DUV lithography, etching and deposition tools from reaching Chinese firms such as Huawei, SMIC, CXMT, Hua Hong and YMTC, even for trailing‑node fabs. It also seeks coordinated action with allies and includes a 75% domestic‑production threshold that could relax bans if China meets most of its own demand. The proposal aims to close loopholes that allow equipment diversion through third‑party channels.

Source: Tom's Hardware